Preparation and properties of TiN and AlN films from alkoxide solution by thermal plasma CVD method
- 17 July 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 370 (1-2), 137-145
- https://doi.org/10.1016/s0040-6090(00)00935-4
Abstract
No abstract availableKeywords
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