Aluminum films prepared by metal-organic low pressure chemical vapor deposition
- 1 April 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 114 (4), 367-377
- https://doi.org/10.1016/0040-6090(84)90136-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- X-ray study of CVD aluminium thin films deposited on silicon and quartz substratesMaterials Chemistry, 1980
- Aluminum coatings by the decomposition of alkylsThin Solid Films, 1977
- Investigation of the thermal decomposition of triethylaluminiumJournal of Inorganic and Nuclear Chemistry, 1967