Optical lithography simulation: Introduction to SPESA
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4), 379-386
- https://doi.org/10.1016/0167-9317(85)90048-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Process Latitude Modeling For Submicron G- And I-Line LithographyPublished by SPIE-Intl Soc Optical Eng ,1985
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Line‐Profile resist development simulation techniquesPolymer Engineering & Science, 1977
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- In-situ measurement of dielectric thickness during etching or developing processesIEEE Transactions on Electron Devices, 1975
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975
- Optical lithographyIEEE Transactions on Electron Devices, 1975