Adsorption sites of bromine on Si(111)1×1 and 7×7 surfaces
- 1 October 1987
- journal article
- Published by Elsevier in Surface Science
- Vol. 188 (3), 378-390
- https://doi.org/10.1016/s0039-6028(87)80195-4
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- An instrument for measurements with standing X-ray wavefields in ultra-high vacuumNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1986
- Measurement of the silicon (111) surface contractionPhysical Review Letters, 1986
- Phase boundary studies with x-ray interference fieldsZeitschrift für Physik B Condensed Matter, 1985
- Chemisorption of bromine on cleaved silicon (111) surfaces: An X-ray standing wave interference spectrometric analysisSurface Science, 1985
- X-Ray standing wave analysis of bismuth implanted in Si(110)Zeitschrift für Physik B Condensed Matter, 1985
- X-ray standing wave fluorescence measurements in ultra-high vacuum: Adsorption of Br on Si(111)−(1×1)Solid State Communications, 1985
- X-ray standing wave analysis with synchrotron radiation applied for surface and bulk systemsPhysics Letters A, 1984
- X-Ray Interferometric Solution of the Surface Registration ProblemPhysical Review Letters, 1984
- Solution to the Surface Registration Problem Using X-Ray Standing WavesPhysical Review Letters, 1982
- X-ray standing wave analysis for bromine chemisorbed on siliconJournal of Vacuum Science and Technology, 1982