Cr absorber etch process for extreme ultraviolet lithography mask fabrication
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6), 2906-2910
- https://doi.org/10.1116/1.1414013
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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