Reactive d.c. magnetron sputtering of the oxides of Ti, Zr, and Hf
- 15 February 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 89 (1-2), 10-15
- https://doi.org/10.1016/s0257-8972(96)02913-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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