Advances in partial-pressure control applied to reactive sputtering
- 15 December 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 39-40, 499-506
- https://doi.org/10.1016/s0257-8972(89)80011-8
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatingsThin Solid Films, 1989
- A new type of transducer for partial pressure controlSurface and Coatings Technology, 1988
- A physical model for eliminating instabilities in reactive sputteringJournal of Vacuum Science & Technology A, 1988
- Gas density reduction effects in magnetronsJournal of Vacuum Science & Technology A, 1988
- High rate reactive sputtering process controlSurface and Coatings Technology, 1987
- Modeling of reactive sputtering of compound materialsJournal of Vacuum Science & Technology A, 1987
- A sputtering windJournal of Vacuum Science & Technology A, 1985
- Partial pressure control of reactively sputtered titanium nitrideJournal of Vacuum Science & Technology A, 1985
- Reactive high rate d.c. sputtering of oxidesThin Solid Films, 1984
- Effect of N2Ar mixing on the reactive sputtering characteristics of siliconThin Solid Films, 1983