Microstructures of TiN and Ti2N deposits prepared by activated reactive evaporation
- 1 November 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (2), 333-339
- https://doi.org/10.1016/0040-6090(79)90037-3
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Transmission electron microscopy studies of TiC and VCTiC deposits prepared by activated reactive evaporationThin Solid Films, 1978
- TiN and TiC coating on cemented carbides by ion platingThin Solid Films, 1978
- Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge processThin Solid Films, 1978
- Hard decorative TiN coatings by ion platingThin Solid Films, 1977
- Applications of wear-resistant thick films formed by physical vapor deposition processesThin Solid Films, 1977
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972