A comparative study on inductively-coupled plasma high-density plasma, plasma-enhanced, and low pressure chemical vapor deposition silicon nitride films
- 1 March 2000
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 18 (2), 372-376
- https://doi.org/10.1116/1.582195
Abstract
No abstract availableKeywords
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