X‐ray lithography
- 1 June 1977
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 17 (6), 385-389
- https://doi.org/10.1002/pen.760170611
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- IIIA-3 LSI and magnetic bubbles device fabrication by X-ray lithographyIEEE Transactions on Electron Devices, 1976
- High speed replication of submicron features on large areas by X-ray lithographyIEEE Transactions on Electron Devices, 1975
- Optical constants from the far infrared to the x-ray region: Mg, Al, Cu, Ag, Au, Bi, C, and Al_2O_3Journal of the Optical Society of America, 1975
- Variable development response of resists using electron beam lithography: Methods and applicationsPolymer Engineering & Science, 1974
- Fabrication techniques for surface-acoustic-wave and thin-film optical devicesProceedings of the IEEE, 1974
- Cathodoluminescence assessment of GaAs1−x Px for light emitting diodesSolid-State Electronics, 1972
- High-resolution pattern replication using soft X raysElectronics Letters, 1972