Processing-structure relations for ferroelectric thin films deposited by ion beam sputter deposition

Abstract

This paper emphasizes the need to determine the relationships between processing and structure (including microstructure) in ferroelectric thin films. The use of an automated ion beam deposition system is demonstrated, which allows the controlled deposition of films at low processing temperatures. A key feature is the real-time composition monitoring, during deposition, which allows stoichiometry to be precisely controlled. Microstructures (including defects) in KNbO3 and lead zirconate titanate films are investigated, and differences between the two materials emphasized.