Diamond synthesis by DC thermal plasma CVD at 1 atm
- 1 September 1991
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 11 (3), 387-394
- https://doi.org/10.1007/bf01458918
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Current Issues and Problems in the Chemical Vapor Deposition of DiamondScience, 1990
- Growth of diamond films on silicon from an oxygen-acetylene flameApplied Physics Letters, 1990
- Growth of Diamond Thin Films by dc Plasma Chemical Vapor Deposition and Characteristics of the PlasmaJapanese Journal of Applied Physics, 1990
- Diamond Growth at Low PressuresMRS Bulletin, 1989
- Diamond—Ceramic Coating of the FutureJournal of the American Ceramic Society, 1989
- Hollow cathode plasma assisted chemical vapor deposition of diamondApplied Physics Letters, 1988
- Crystallization of diamond crystals and films by microwave assisted CVD (Part II)Materials Research Bulletin, 1988
- Synthesis of diamond films in a rf induction thermal plasmaApplied Physics Letters, 1987
- Synthesis of Diamond Under Metastable ConditionsAnnual Review of Materials Science, 1987
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982