Oxygen incorporation during CrSi deposition
- 1 August 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 203 (2), 343-356
- https://doi.org/10.1016/0040-6090(91)90142-k
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Orientation dependent adsorption on a cylindrical silicon crystal: II. OxygenSurface Science, 1985
- Deposition of Cr-Si thin films by reactive plasmatron-magnetron sputteringThin Solid Films, 1985
- An investigation of silicon-oxygen interactions using Auger electron spectroscopySurface Science, 1971