Deposition of Cr-Si thin films by reactive plasmatron-magnetron sputtering
- 1 June 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 128 (1-2), 149-159
- https://doi.org/10.1016/0040-6090(85)90343-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- CrSi resistive films produced by magnetron-plasmatron sputteringThin Solid Films, 1982
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- Use of the ring gap plasmatron for high rate sputteringThin Solid Films, 1977
- Structural and electrical properties of CrSi2 thin film resistorsThin Solid Films, 1976
- Sputtered Silicon–Chromium Resistive FilmsJournal of Vacuum Science and Technology, 1969
- Resistivity and Structure of Cr–SiO Cermet FilmsJournal of Vacuum Science and Technology, 1967