Optical constants of palladium silicides measured by a multiple-wavelength ellipsometer
- 15 October 1986
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 34 (8), 5438-5442
- https://doi.org/10.1103/physrevb.34.5438
Abstract
The optical absorption and dispersion of as-deposited Pd, Si, and PdSi are measured by an ellipsometer at wavelengths of 400 to 700 nm. The imaginary part of the refractive index is shown to decrease by a value of 4 from the as-deposited Pd to the high-temperature annealed PdSi. The binding energy of the Pd 3 core electrons shifts by 1.8±0.2 eV as studied by x-ray photoelectron spectroscopy.
Keywords
This publication has 6 references indexed in Scilit:
- Ellipsometry measurements of nickel silicidesJournal of Applied Physics, 1986
- Formation of nickel and palladium silicides by a short-pulse light-flash and its application in the metallization of solar cellsSolid-State Electronics, 1983
- Infrared optical constants of PtSiApplied Physics Letters, 1983
- An absolute measurement of optical reflectivity by modification of a WMS systemJournal of Physics E: Scientific Instruments, 1981
- Metal/silicon interface formation: The Ni/Si and Pd/Si systemsJournal of Vacuum Science and Technology, 1981
- Photoelectron and Auger SpectroscopyPublished by Springer Nature ,1975