Influence of post-deposition annealing on the electrical conductivity of indium-tin-oxide films
- 16 November 1989
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 116 (1), K65-K67
- https://doi.org/10.1002/pssa.2211160157
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Effect of the oxygen absorption on properties of ITO layersVacuum, 1989
- Effect of post-deposition vacuum annealing on properties of ITO layersVacuum, 1988
- Preparation and characterization of indium tin oxide films produced by the d.c. sputtering techniqueThin Solid Films, 1985
- The effect of annealing on the optical properties of indium tin oxide filmsThin Solid Films, 1984