New Technique for Preparation of BiSrCaCuO Thin Films with Tc of 100 K and Above
- 1 August 1988
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 27 (8A), L1484
- https://doi.org/10.1143/jjap.27.l1484
Abstract
The successful growth of superconducting BiSrCaCuO thin films has been reported by a new process based on rf magnetron sputtering. The formation of a partially melted underlayer by controlling the substrate temperature during an early stage of the deposition process appeared to be responsible for a marked improvement in T c. A zero-resistance temperature of 100 K and above was achieved with very high reproducibility when the film was deposited on MgO(100) substrate using a target of Bi1.3Sr1Ca1Cu1.5O x followed by annealing at 875°C for 0.5 h.Keywords
This publication has 9 references indexed in Scilit:
- Preparation of Thin Films by Coevaporation and Phase Identification in Bi-Sr-Ca-Cu-O SystemJapanese Journal of Applied Physics, 1988
- Preparation and Properties of Superconducting Bi-Sr-Ca-Cu-O Thin FilmsJapanese Journal of Applied Physics, 1988
- On the 110 K Superconductor in the Bi-Ca-Sr-Cu-O SystemJapanese Journal of Applied Physics, 1988
- An X-Ray Diffraction and Electron Microscopic Study of a New High-Tc Superconductor based on the Bi-Ca-Sr-Cu-O SystemJapanese Journal of Applied Physics, 1988
- Sputter Deposition of BiSrCaCuO Thin FilmsJapanese Journal of Applied Physics, 1988
- Preparation of New High-Tc Superconducting Oxide Bi-Sr-Ca-Cu-O Thin Film by Electron Beam Deposition TechniqueJapanese Journal of Applied Physics, 1988
- Magnetron Sputtering of Bi-Ca-Sr-Cu-O Thin Films with Superconductivity above 80 KJapanese Journal of Applied Physics, 1988
- Identification of the Superconducting Phase in the Bi-Ca-Sr-Cu-O SystemJapanese Journal of Applied Physics, 1988
- A New High-Tc Oxide Superconductor without a Rare Earth ElementJapanese Journal of Applied Physics, 1988