Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering
- 1 December 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 270 (1-2), 37-42
- https://doi.org/10.1016/0040-6090(95)06889-9
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Electrical and optical properties of indium tin oxide thin films prepared on low-temperature substrates by rf magnetron sputtering under an applied external magnetic fieldJournal of Applied Physics, 1988
- Amorphous-to-crystalline transition of indium oxide films deposited by reactive evaporationThin Solid Films, 1987
- Transparent conducting oxides of metals and alloys made by reactive magnetron sputtering from elemental targetsVacuum, 1986
- The influence of substrate temperature and sputtering gas atmosphere on the electrical properties of reactively sputtered indium tin oxide filmsThin Solid Films, 1986
- Transparent conducting zinc oxide and indium–tin oxide films prepared by modified reactive planar magnetron sputteringJournal of Vacuum Science & Technology A, 1983
- Properties of tin doped indium oxide thin films prepared by magnetron sputteringJournal of Applied Physics, 1983
- Deposition of transparent heat-reflecting coatings of metal oxides using reactive planar magnetron sputtering of a metal and/or alloyThin Solid Films, 1981
- Preparation of conducting and transparent thin films of tin-doped indium oxide by magnetron sputteringApplied Physics Letters, 1980
- Properties of Sn‐Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive SputteringJournal of the Electrochemical Society, 1979
- Production and Properties of Transparent Electroconductive Coating on Polyester FilmJapanese Journal of Applied Physics, 1974