Ion beam sputtering and its application for the deposition of semiconducting films
- 1 November 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 13 (2), 359-366
- https://doi.org/10.1016/0040-6090(72)90306-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- In-situ-Beobachtungen von Sputtering-Prozessen im ElektronenmikroskopPhysica Status Solidi (a), 1971
- Epitaxial Growth of Silicon Films on Sapphire and Spinel by Vacuum EvaporationJapanese Journal of Applied Physics, 1971
- Growth of epitaxial silicon layers by ion beam sputteringJournal of Materials Science, 1970
- Duoplasmatron Ion Beam Source for Vacuum Sputtering of Thin FilmsReview of Scientific Instruments, 1967
- Removal of Iodized Oil After MyelographyPublished by American Medical Association (AMA) ,1964