Deep reactive ion etching of commercial PMMA in O2/CHF3, and O2/Ar-based discharges
- 18 March 2004
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 14 (5), 663-666
- https://doi.org/10.1088/0960-1317/14/5/001
Abstract
No abstract availableKeywords
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