Gratings for Integrated Optics by Electron Lithography
- 1 July 1974
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 13 (7), 1695-1702
- https://doi.org/10.1364/ao.13.001695
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.This publication has 13 references indexed in Scilit:
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- Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resistsJournal of Applied Physics, 1973
- A Simple Flying Spot Scanner Design for Electron LithographyReview of Scientific Instruments, 1973
- Optical technique for producing 0.1-μ periodic surface structuresApplied Physics Letters, 1973
- A high efficiency thin grating coupler for integrated opticsOptics Communications, 1973
- Electron-Resist Fabrication of Bends and Couplers for Integrated Optical CircuitsApplied Optics, 1973
- Ion Beam Micromachining of Integrated Optics ComponentsApplied Optics, 1973
- Organosilicon Films Formed by an RF Plasma Polymerization ProcessJournal of the Electrochemical Society, 1972
- Holographic Thin Film CouplersBell System Technical Journal, 1970
- GRATING COUPLER FOR EFFICIENT EXCITATION OF OPTICAL GUIDED WAVES IN THIN FILMSApplied Physics Letters, 1970