Electro−optic intensity modulation in LiTaO3 ridge waveguide
- 15 March 1975
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 26 (6), 298-300
- https://doi.org/10.1063/1.88164
Abstract
A narrow rectangular ridge for 24 μm (width of the top) ×6 μm (height) ×5.4 mm (length) has been formed on Cu−diffused x−plate LiTaO3 using the sputter−etching technique. The intensity modulation of the optical wave confined in the ridge has been made up to 1 GHz with a half−wave voltage of 25−30 V at 6328 Å.Keywords
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