Dose and energy dependence of implanted ion profiles (9:≦ 1 ≦ 83) in the AZ111 photoresist
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 19-20, 882-886
- https://doi.org/10.1016/s0168-583x(87)80176-3
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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