Deposition of Ti-N compounds by thermionically assisted triode reactive ion plating
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3), 541-549
- https://doi.org/10.1016/0040-6090(80)90545-3
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
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