Characterization of anodic aluminum oxide film and its application to amorphous silicon thin film transistors
- 29 February 1996
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 43 (2), 166-172
- https://doi.org/10.1016/0254-0584(95)01619-6
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Application of amorphous silicon field effect transistors in addressable liquid crystal display panelsApplied Physics A, 1981
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