Growth of amorphous Ti2O3 layers by laser-induced oxidation
- 15 October 1984
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 45 (8), 852-853
- https://doi.org/10.1063/1.95424
Abstract
Amorphous Ti2O3 films with thicknesses ≳103 Å have been obtained by cw laser irradiation of Ti50Zr10Be40 exposed to low oxygen pressures. In contrast, thermal oxidation of (nonirradiated) samples reveals scales composed of crystalline oxides. Raman scattering, x‐ray, and electron microscopy data on the layers are reported. It is suggested that irradiation leads to an enhanced oxidation rate preventing crystallization. Possible mechanisms of enhancement are discussed.Keywords
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