Microcrystalline structure in glow-discharge-produced silicon films
- 1 February 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 38 (3), 142-143
- https://doi.org/10.1063/1.92279
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H FilmsJapanese Journal of Applied Physics, 1980
- Electrical and optical properties of amorphous Si:F:H alloysPhilosophical Magazine Part B, 1979
- Amorphous silicon solar cellApplied Physics Letters, 1976
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976
- Substitutional doping of amorphous siliconSolid State Communications, 1975