Lateral growth of titanium silicide over a silicon dioxide layer
- 1 April 1983
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 54 (4), 2114-2115
- https://doi.org/10.1063/1.332265
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Lateral diffusion of Ni and Si through Ni2Si in Ni/Si couplesApplied Physics Letters, 1982
- Thin film interaction between titanium and polycrystalline siliconJournal of Applied Physics, 1980
- Solid state reactions in titanium thin films on siliconThin Solid Films, 1976
- Implanted noble gas atoms as diffusion markers in silicide formationThin Solid Films, 1975