Influence of barrier inhomogeneities on noise at Schottky contacts

Abstract
Electronic properties of Schottky diodes depend sensitively on spatial inhomogeneities of the metal/semiconductor interface. We find that, contrary to previous theories for low-frequency noise, the electronic properties of Schottky contacts cannot be understood if one neglects spatial fluctuations of the Schottky barrier height. Our systematic investigation of several silicide/silicon diodes yields as an empirical law that excess noise increases drastically when the standard deviation σs of the spatial distribution of Schottky barrier heights exceeds the critical threshold value of 2kT.