Structures and electrical properties of zinc oxide films prepared by low pressure sputtering system
- 1 February 1971
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 7 (2), 135-145
- https://doi.org/10.1016/0040-6090(71)90032-0
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Low Pressure Sputtering System of the Magnetron TypeReview of Scientific Instruments, 1969
- Crystallographic Orientation of Zinc Oxide Films Deposited by Triode SputteringJournal of Vacuum Science and Technology, 1969
- ZINC-OXIDE FILM MICROWAVE ACOUSTIC TRANSDUCERSApplied Physics Letters, 1967
- PREPARATION OF ZnO THIN FILMS BY SPUTTERING OF THE COMPOUND IN OXYGEN AND ARGONApplied Physics Letters, 1966
- The dielectric constant of zinc oxide over a range of frequenciesBritish Journal of Applied Physics, 1958