Influence of mechanical and chemical silicon surface preparation on diamond nucleation and growth in CH4/H2 system discharge
- 10 July 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 106 (1), 53-59
- https://doi.org/10.1016/s0257-8972(98)00497-6
Abstract
No abstract availableKeywords
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