Evidence of dissociation of water on the Si(100)2 × 1 surface
- 15 June 1984
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 29 (12), 6974-6976
- https://doi.org/10.1103/physrevb.29.6974
Abstract
High-resolution infrared spectroscopy of the Si(100)2 × 1 surface upon water exposure shows that, in the temperature range investigated (80 to 500 K), the adsorption is dissociative. Molecular water can only be adsorbed at low temperatures on a surface with saturated dangling bonds.Keywords
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