Glow-Discharge Deposition of a-Si: H from Pure Si2H6 and Pure SiH4
- 1 February 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (2A), L115
- https://doi.org/10.1143/jjap.22.l115
Abstract
Optical emission spectroscopy and mass spectrometry have been employed as diagnostic tools for studying the glow discharge plasma of pure SiH4 and pure Si2H6. It has been suggested that the dimeric species play an important role in the deposition of a-Si: H from Si2H6 glow discharge in contrast to the monomeric species of SiH dominant in the deposition from pure SiH4. A large amount of hydrogen which is not bonded with Si is incorporated in a-Si: H films prepared from Si2H6 and this might be reflected in the dark and photoconductivity of the films.Keywords
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