Oxidation of etched silicon in air at room temperature; Measurements with ultrasoft X-ray photoelectron spectroscopy (ESCA) and neutron activation analysis
- 2 May 1983
- journal article
- Published by Elsevier in Surface Science
- Vol. 128 (1), 169-175
- https://doi.org/10.1016/0039-6028(83)90388-6
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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- Observation of Etching of n-Type Silicon in Aqueous HF SolutionsJournal of the Electrochemical Society, 1967
- Optical Measurement of Film Growth on Silicon and Germanium Surfaces in Room AirJournal of the Electrochemical Society, 1957