Epitaxial growth of β-FeSi2 on silicon (111): a real-time RHEED analysis
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 56-58, 438-443
- https://doi.org/10.1016/0169-4332(92)90267-2
Abstract
No abstract availableKeywords
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