Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films
- 1 September 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 395 (1-2), 288-291
- https://doi.org/10.1016/s0040-6090(01)01287-1
Abstract
No abstract availableKeywords
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