Indium-tin oxide deposition by d.c. reactive sputtering on a low softening point material
- 1 October 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 191 (2), 297-303
- https://doi.org/10.1016/0040-6090(90)90381-m
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- A physical model for eliminating instabilities in reactive sputteringJournal of Vacuum Science & Technology A, 1988
- Pressure stability in reactive magnetron sputteringThin Solid Films, 1988