Properties of microcrystalline P doped Si:H films
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 827-830
- https://doi.org/10.1016/0022-3093(83)90298-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low-temperature crystallization of doped a-Si:H alloysApplied Physics Letters, 1980
- Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H FilmsJapanese Journal of Applied Physics, 1980
- Properties of heavily doped GDSi with low resistivityJournal of Non-Crystalline Solids, 1979
- The Electrical Resistance of Binary Metallic MixturesJournal of Applied Physics, 1952