Effects of hydrogen atoms on the network structure of hydrogenated amorphous and microcrystalline silicon thin films
- 5 February 1990
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 56 (6), 533-535
- https://doi.org/10.1063/1.102736
Abstract
By alternating the deposition of a several-angstrom-thick hydrogenated amorphous silicon layer and the exposure to a hydrogen plasma, the structure of the resultant hydrogenated silicon films is varied from device-grade amorphous to microcrystalline without any change in the film precursors. On the basis of experimental results, the effects of hydrogen atoms reaching the film-growing surface on the Si-Si network structure are discussed.Keywords
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