A rotating ring-disc study of the photodissolution of n-Si in ammonium fluoride solutions
- 1 July 1991
- journal article
- research article
- Published by Elsevier in Journal of Electroanalytical Chemistry and Interfacial Electrochemistry
- Vol. 309 (1-2), 325-331
- https://doi.org/10.1016/0022-0728(91)87024-x
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Photocorrosion of n-Si in ammonium fluoride solutions: an investigation by in-situ Fourier transform infrared spectroscopyJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Photocurrent multiplication during photodissolution of n-Si in NH4FJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- Anodic dissolution of p- and n-type siliconJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1990
- In SituCharacterization of the Illuminated Silicon-Electrolyte Interface by Fourier-Transform Infrared SpectroscopyPhysical Review Letters, 1989
- Deconvolution of Charge Injection Steps in Quantum Yield Multiplication on SiliconPhysical Review Letters, 1988
- The electrochemical behaviour of n‐type silicon (111)‐surfaces in fluoride containing aqueous electrolytesBerichte der Bunsengesellschaft für physikalische Chemie, 1987
- Anodic properties of n-Si and n-Ge electrodes in HF solution under illumination and in the darkJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1983
- Anodic dissolution of silicon in hydrofluoric acid solutionsSurface Science, 1966