Influence of alkaali and halogen implantation on electrical properties of amorphous silicon
- 29 February 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 321-326
- https://doi.org/10.1016/0022-3093(80)90614-6
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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