Nondestructive thickness measurement of thin films on microstructures
- 30 November 1968
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 11 (11), 987-988
- https://doi.org/10.1016/0038-1101(68)90120-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Thickness measurement of silicon dioxide layers by ultraviolet-visible interference methodSolid-State Electronics, 1964
- Nondestructive Determination of Thickness and Refractive Index of Transparent FilmsIBM Journal of Research and Development, 1964
- An Investigation of the Optical Properties and the Growth of Oxide Films on SiliconJournal of the Electrochemical Society, 1963
- Optical Constants of Silicon in the Region 1 to 10 evPhysical Review B, 1960
- Precision Measurement of Absolute Specular Reflectance with Minimized Systematic ErrorsJournal of the Optical Society of America, 1960