Temperature of amorphous chalcogenide films during growth by physical vapor deposition
- 1 August 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 11 (2), 219-228
- https://doi.org/10.1016/0040-6090(72)90047-8
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. TheoreticalJournal of Applied Physics, 1971
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- Thermoelectric Power of Vacuum-Evaporated Au–Ni Thin-Film ThermocouplesJournal of Applied Physics, 1969
- Measurements of Temperature of Thin Metal Films during Vapor DepositionJapanese Journal of Applied Physics, 1968
- Temperature Changes in Thin Metal Films during Vapor DepositionJournal of Applied Physics, 1967