Mechanical integrity of polysilicon films exposed to hydrofluoric acid solutions
- 1 September 1991
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 20 (9), 665-670
- https://doi.org/10.1007/bf02654536
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Integrated fabrication of polysilicon mechanismsIEEE Transactions on Electron Devices, 1988
- Fine-grained polysilicon films with built-in tensile strainIEEE Transactions on Electron Devices, 1988
- Monolithic polycrystalline-silicon pressure transducerElectronics Letters, 1974