Anomalous diffusion of arsenic in silicon during low-temperature heat treatment
- 15 August 1975
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 27 (4), 230-231
- https://doi.org/10.1063/1.88439
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Arsenic Clustering in SiliconJournal of Applied Physics, 1971
- A STUDY OF DIFFUSED LAYERS OF ARSENIC AND ANTIMONY IN SILICON USING THE ION-SCATTERING TECHNIQUEApplied Physics Letters, 1970
- Resistivity of Bulk Silicon and of Diffused Layers in SiliconBell System Technical Journal, 1962
- Diffusion of Donor and Acceptor Elements in SiliconJournal of Applied Physics, 1956