rf modulation of positive-ion energies in low-pressure discharges
- 1 December 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (11), 5519-5527
- https://doi.org/10.1063/1.347011
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Ion and electron energy analysis at a surface in an RF dischargeJournal of Physics D: Applied Physics, 1988
- Space Potential and Ion Energies in a Low Pressure Discharge Containing at least Two Negative SpeciesMRS Proceedings, 1988
- An electrostatic probe technique for RF plasmaJournal of Physics E: Scientific Instruments, 1987
- A model of radio frequency planar dischargesJournal of Applied Physics, 1986
- Techniques for using emitting probes for potential measurement in rf plasmasReview of Scientific Instruments, 1986
- Distribution of ion energies incident on electrodes in capacitively coupled rf dischargesJournal of Applied Physics, 1985
- Effects of frequency on optical emission, electrical, ion, and etching characteristics of a radio frequency chlorine plasmaJournal of Applied Physics, 1985
- Propagation of Ion-Acoustic Waves in a Two-Electron-Temperature PlasmaPhysical Review Letters, 1975
- Calculation of Ion Bombarding Energy and Its Distribution in rf SputteringPhysical Review B, 1968
- The Effect of Space Charge and Residual Gases on Thermionic Currents in High VacuumPhysical Review B, 1913