Growth of SiO2 films on Si in an oxygen microwave discharge
- 1 May 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 34 (1), 115-117
- https://doi.org/10.1016/0040-6090(76)90146-2
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Silicon Oxide Films Grown in a Microwave DischargeJournal of Applied Physics, 1967
- The properties of plasma-grown SiO2 filmsSurface Science, 1967
- Silicon Oxidation in an Oxygen Plasma Excited by MicrowavesJournal of Applied Physics, 1965