The properties of plasma-grown SiO2 films
- 31 July 1967
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 7 (3), 490-495
- https://doi.org/10.1016/0039-6028(67)90038-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- DENSITY OF SiO2–Si INTERFACE STATESApplied Physics Letters, 1966
- Silicon Oxidation in an Oxygen Plasma Excited by MicrowavesJournal of Applied Physics, 1965
- Structural Evaluation of Silicon Oxide FilmsJournal of the Electrochemical Society, 1965