Determination of sheath potentials in rf plasmas
- 30 January 1989
- journal article
- Published by Elsevier in Physics Letters A
- Vol. 134 (8-9), 480-483
- https://doi.org/10.1016/0375-9601(89)90689-0
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- A magnetic multipole reactor for high-flux reactive-ion etchingJournal of Applied Physics, 1988
- Ion energy measurement at the powered electrode in an rf dischargeJournal of Applied Physics, 1988
- Distribution of ion energies incident on electrodes in capacitively coupled rf dischargesJournal of Applied Physics, 1985
- Time-resolved optical diagnostics of radio frequency plasmasJournal of Vacuum Science & Technology A, 1985
- The cross section for symmetric charge exchange of Ne+in Ne and Ar+in Ar at low energiesJournal of Physics B: Atomic and Molecular Physics, 1982
- Electrical Properties of RF Sputtering SystemsIBM Journal of Research and Development, 1979
- Measurement of the symmetric charge-exchange cross section in helium and argon in the impact energy range 1-10 keVJournal of Physics B: Atomic and Molecular Physics, 1978
- Plasma confinement by localized cuspsPhysics of Fluids, 1976
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Anomalies of the Energy of Positive Ions Extracted from High-Frequency Ion Sources. A Theoretical StudyJournal of Applied Physics, 1968