Niobium Josephson junctions with doped amorphous silicon barriers
- 1 January 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 15 (1), 488-489
- https://doi.org/10.1109/tmag.1979.1060117
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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